JPH0632680Y2 - 半導体製造装置の加熱炉 - Google Patents
半導体製造装置の加熱炉Info
- Publication number
- JPH0632680Y2 JPH0632680Y2 JP8823789U JP8823789U JPH0632680Y2 JP H0632680 Y2 JPH0632680 Y2 JP H0632680Y2 JP 8823789 U JP8823789 U JP 8823789U JP 8823789 U JP8823789 U JP 8823789U JP H0632680 Y2 JPH0632680 Y2 JP H0632680Y2
- Authority
- JP
- Japan
- Prior art keywords
- heating furnace
- insertion hole
- coating material
- semiconductor manufacturing
- coat layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000010438 heat treatment Methods 0.000 title claims description 15
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 239000004065 semiconductor Substances 0.000 title claims description 5
- 238000003780 insertion Methods 0.000 claims description 23
- 230000037431 insertion Effects 0.000 claims description 23
- 239000010410 layer Substances 0.000 claims description 13
- 230000002093 peripheral effect Effects 0.000 claims description 6
- 239000002345 surface coating layer Substances 0.000 claims 1
- 239000011248 coating agent Substances 0.000 description 20
- 238000000576 coating method Methods 0.000 description 20
- 239000000463 material Substances 0.000 description 17
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 8
- 239000000835 fiber Substances 0.000 description 6
- 239000000919 ceramic Substances 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 239000011247 coating layer Substances 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Landscapes
- Waste-Gas Treatment And Other Accessory Devices For Furnaces (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8823789U JPH0632680Y2 (ja) | 1989-07-27 | 1989-07-27 | 半導体製造装置の加熱炉 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8823789U JPH0632680Y2 (ja) | 1989-07-27 | 1989-07-27 | 半導体製造装置の加熱炉 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0327039U JPH0327039U (en]) | 1991-03-19 |
| JPH0632680Y2 true JPH0632680Y2 (ja) | 1994-08-24 |
Family
ID=31637860
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8823789U Expired - Lifetime JPH0632680Y2 (ja) | 1989-07-27 | 1989-07-27 | 半導体製造装置の加熱炉 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0632680Y2 (en]) |
-
1989
- 1989-07-27 JP JP8823789U patent/JPH0632680Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0327039U (en]) | 1991-03-19 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |